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TETRAMETHYL AMMONIUM HYDROXIDE PENTAHYDRATE FOR SYNTHESIS

TETRAMETHYL AMMONIUM HYDROXIDE PENTAHYDRATE FOR SYNTHESIS
SKU
RXSOL-60-6605-695
Also known as

TETRAMETHYL AMMONIUM HYDROXIDE PENTAHYDRATE FOR SYNTHESIS

It is used as a basic solvent in the development of acidic photoresist in the photolithography process, and is highly effective in stripping photoresist. TMAH has some phase transfer catalyst properties, and is used as a surfactant in the synthesis of ferrofluid, to inhibit nanoparticle aggregation.
Safety data sheet: Sigma-Aldrich MSDS for TM...
 
Note

Ammonia has alkaline properties and is corrosive. Ammonia gas dissolves easily in water to form ammonium hydroxide, a caustic solution and weak base. Ammonia gas is easily compressed and forms a clear liquid under pressure. Ammonia is usually shipped as a compressed liquid in steel containers.

TMAH solution is widely used in the electronics industry as a developer or cleaner. TMAH is typically one of several ingredients in etching / stripping mixtures, although it may also be used as a pure chemical. It is often used in solution in water, and less frequently, in methanol.

KOH and TMAH are anisotropic silicon etches, used to make V-grooves, membranes, and holes through wafers, as well as other devices. ... KOH is simply the hydroxide of potassium. TMAH is a organic hydroxide and stands for Tetramethyl ammonium hydroxide.

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