Tetramethylammonium hydroxide solution (25 wt. % solution in water) may be used as a base for pH adjustment to obtain hexagonal mesoporous aluminophosphate (TAP). Tetramethylammonium hydroxide is a quaternary ammonium salt generally used as an anisotropic etchant for silicon due to its high silicon etching rate.
One of the industrial uses of TMAH is for the anisotropic etching of silicon. It is used as a basic solvent in the development of acidic photoresist in the photolithography process, and is highly effective in stripping photoresist.
TETRAMETHYL AMMONIUM HYDROXIDE SOLUTION 25% Supplier Oman Muscat Barka Salalah Sohar Ruwi Mutrah Nizwa Al Hamra Manah
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